| 1. | Development in atomic layer deposition and its applications
原子层沉积技术及应用发展概况 |
| 2. | Electrochemical atomic layer epitaxy and research progress of its application in preparation of new materials
电化学原子层外延及其新材料制备应用研究进展 |
| 3. | The atomic layer , highlighted in yellow , enables the development of a unified grid infrastructure
Atomic层以黄色表示，它可以用来开发统一的网格基础设施。 |
| 4. | These ping pong - sized balls of fused quartz and silicon are 3 . 8 cm across and never vary from a perfect sphere by more than 40 atomic layers
这些如乒乓球般大小，以石英和硅融合而成的球体直径约3 . 8厘米，偏离完美球体的程度不会多于40层原子。 |
| 5. | The images of the single crystals with different ge concentration were gotten by means of afm method . the atomic layer patterns of different crystals were gotten
利用原子力显微镜( afm )对不同锗浓度的硅锗单晶的形貌进行了观察，得到了不同单晶的原子层形貌。 |
| 6. | Atomic layer deposition ( ald ) has attracted a lot of attention recently for its excellent deposition abilities , such as almost 100 % step coverage , accurate thickness control , large area uniformity , excellent process stability , and low processing temperatures
摘要最近原子层沉积( ald )吸引著许多的注意，原因在于它杰出的沉积技术能力，例如几乎100 %的阶梯覆盖、精准的薄膜厚度控制、大面积薄膜的均匀性、优异的制程稳定度与低温的制程。 |
